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5962R9569001TCC Просмотр технического описания (PDF) - Intersil

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5962R9569001TCC Datasheet PDF : 2 Pages
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Die Characteristics
DIE DIMENSIONS:
(2420µm x 2530µm x 483µm ±25.4µm)
95 x 99 x 19mils ±1mil
METALLIZATION:
Type: Al Si Cu
Thickness: 16.0kÅ ±2kÅ
SUBSTRATE POTENTIAL:
Unbiased (DI)
BACKSIDE FINISH:
Silicon
Metallization Mask Layout
+IN2
HS-5104ARH-T
PASSIVATION:
Type: Nitride (Si3N4) over Silox (SiO2)
Nitride Thickness: 3.5kÅ ±1.5kÅ
Silox Thickness: 12.0kÅ ±2kÅ
WORST CASE CURRENT DENSITY:
< 2.0e5 A/cm2
TRANSISTOR COUNT:
175
PROCESS:
Bipolar DI
HS-5104ARH-T
V+
+IN1
-IN2
-IN1
OUT2
OUT3
-IN3
+IN3
OUT1
OUT4
-IN4
V-
+IN4
All Intersil semiconductor products are manufactured, assembled and tested under ISO9000 quality systems certification.
Intersil semiconductor products are sold by description only. Intersil Corporation reserves the right to make changes in circuit design and/or specifications at any time with-
out notice. Accordingly, the reader is cautioned to verify that data sheets are current before placing orders. Information furnished by Intersil is believed to be accurate and
reliable. However, no responsibility is assumed by Intersil or its subsidiaries for its use; nor for any infringements of patents or other rights of third parties which may result
from its use. No license is granted by implication or otherwise under any patent or patent rights of Intersil or its subsidiaries.
For information regarding Intersil Corporation and its products, see web site http://www.intersil.com
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