C7460 Просмотр технического описания (PDF) - Hamamatsu Photonics

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C7460

Multiband Plasma-Process Monitor

Hamamatsu Photonics 

Multiband Plasma-Process Monitor

Model C7460

The Multiband Plasma-Process Monitor

(MPM) is a system specifically designed for

monitoring the optical plasma emissions that

are created during the various manufacturing

processes of semiconductors including

etching, sputtering, cleaning, and CVD.

The MPM can handle multi-channel recording

in real-time.

q Simultaneous measurement

from 200 to 950 nm

q Easy measurement using

optical fiber input

q High levels of accuracy and

reliability

q Software for measurement,

analysis and factory integration

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